OFERTA FORMATIVA DCM - FCT/UNL
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HOSITRAD PECVD
Location: Clean room CEMOP – thin-film deposition lab
Responsible: Tiago Mateus, Hugo Águas
Description:
Plasma Enhanced Chemical Vapor Deposition tool, inline extending arm type system for depositing amorphous (a-Si) thin films and solar cells.
Specifications:
• 3 PECVD chambers dedicated to intrinsic, n and p doped silicon deposition
• 8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
• 1 RF generator
• 1 load lock chamber
• Heated chambers up to 200°C
• UPS emergency power supply
• Gas scrubber for emission treatment
Responsible: Tiago Mateus, Hugo Águas
Description:
Plasma Enhanced Chemical Vapor Deposition tool, inline extending arm type system for depositing amorphous (a-Si) thin films and solar cells.
Specifications:
• 3 PECVD chambers dedicated to intrinsic, n and p doped silicon deposition
• 8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
• 1 RF generator
• 1 load lock chamber
• Heated chambers up to 200°C
• UPS emergency power supply
• Gas scrubber for emission treatment
