ELETTRORAVA PECVD

Location: Clean room CEMOP – thin-film deposition lab
Responsible: Tiago Mateus, Hugo Águas
 
Description:
Plasma Enhanced Chemical Vapor Deposition tool, spider type system for depositing amorphous (a-Si) and nano-crystalline (nc-Si) silicon thin films and solar cells.
Specifications:
•    3 PECVD chambers dedicated to intrinsic, n and p doped silicon deposition with ad-justable electrode Z position
•    8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
•    1 VHF generator up to 100MHz
•    1 PVD chamber dedicated to deposit TCO
•    1 magnetron source for 3” targets, with adjustable Z position
•    1 DC-pulsed generator
•    1 central load lock chamber
•    2 RF generator
•    1 VHF generator up to 100MHz
•    Heated chambers up to 400°C
•    UPS emergency power supply
•    Gas scrubber for emission treatment