“3 target” home-made sputtering

Location: Clean room CEMOP – thin-film deposition lab
Responsible: Luís Pereira
 
Description:
Home-made sputtering tool with 3” and 2” sputtering sources and RF generator for thin film deposition on up to 6” wafers. Substrate temperature controllable between RT and 400 °C.
Specifications:
-    1x RF generator and automated matching boxes, up to 300 W
-    2x magnetron sources for 3” targets, with adjustable XYZ positions
-    1x magnetron source for 2” targets, with adjustable XYZ positions
-    Substrate temperature up to 400 °C
-    3 gas lines with mass flow controllers (Ar, O₂ and N₂)