“3 chamber” PECVD

Location: Clean room CEMOP – thin-film deposition lab
Responsible: Tiago Mateus, Hugo Águas
 
Description:
Plasma-enhanced chemical vapor deposition (PECVD) tool with 3 dedicated chambers for deposition of Si-based thin films.
Specifications:
•    3 isolated PECVD chambers dedicated to intrinsic, n and p doped silicon deposition
•    8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
•    3 RF generators
•    1 VHF generator (27MHz)
•    Heated chambers up to 300°C
•    Gas scrubber for emission treatment