OFERTA FORMATIVA DCM - FCT/UNL
Navigation
“Pfeiffer” sputtering
Location: Clean room CEMOP – thin-film deposition lab
Responsible: Luís Pereira
Description:
Sputtering tool with 3” and 2” sputtering sources and RF generator for thin film deposition on up to 6” wafers. Substrate temperature controllable between RT and 400 °C.
Specifications:
- 1x RF generator and automated matching boxes, up to 300 W
- 1x magnetron source for 3” targets, with adjustable Z position
- 1x magnetron source for 2” targets, with adjustable Z position
- Substrate temperature up to 400 °C
- 3 gas lines with mass flow controllers (Ar, O2 and N2)
- Controllable substrate rotation for improved uniformity or for coating sequential substrates without breaking vacuum
Responsible: Luís Pereira
Description:
Sputtering tool with 3” and 2” sputtering sources and RF generator for thin film deposition on up to 6” wafers. Substrate temperature controllable between RT and 400 °C.
Specifications:
- 1x RF generator and automated matching boxes, up to 300 W
- 1x magnetron source for 3” targets, with adjustable Z position
- 1x magnetron source for 2” targets, with adjustable Z position
- Substrate temperature up to 400 °C
- 3 gas lines with mass flow controllers (Ar, O2 and N2)
- Controllable substrate rotation for improved uniformity or for coating sequential substrates without breaking vacuum
