Hot plates

Location: Clean room CEMOP – lithography lab
Responsible: Pedro Barquinha
3 hotplates for resist baking and device annealing. Up to 20 cm x 20 cm area and 450 °C temperature.
•    Torrey Pines HS40A-2 (x3)
    o    Programmable and manual operation, with controllable heating ramp.
    o    Maximum temperature: 450 °C
    o    Stirring capability, 100-1500 rpm
    o    Up to 20 cm x 20 cm substrate size
•     Fisher Scientific Isotemp
    o    Maximum temperature: 550 °C
    o    Surface area heating: 18.4 x 18.4 cm