Location: Clean room CEMOP – lithography lab
Responsible: Pedro Barquinha Description: 3 hotplates for resist baking and device annealing. Up to 20 cm x 20 cm area and 450 °C temperature.
Specifications:• Torrey Pines HS40A-2 (x3)
o Programmable and manual operation, with controllable heating ramp.
o Maximum temperature: 450 °C
o Stirring capability, 100-1500 rpm
o Up to 20 cm x 20 cm substrate size
• Fisher Scientific Isotemp
o Maximum temperature: 550 °C
o Surface area heating: 18.4 x 18.4 cm