Heidelberg µPG 101 Tabletop Micro Pattern Generator

Location: Clean room CEMOP – lithography lab
Responsible: Pedro Barquinha
Tabletop micropattern generator for direct writing applications and low volume mask fabrication, compatible with up to 6” substrates and enabling features sizes with 600 nm resolution.
•    Substrate size from 1 cm x 1 cm to 15 cm x 15 cm
•    Substrate thickness up to 12 mm
•    UV Laser diode, 375 nm, 70 mW for exposure of positive and negative resist, including SU8
•    Camera system for substrate inspection and automatic alignment
•    Real-time autofocus
•    Two writing modes:
    o    Mode I – minimum structure size 0.6 µm, write speed 1 mm2/min, write area 5 cm x 5 cm
    o    Mode IV – minimum structure size 5 µm, write speed 90 mm2/min, write area 12.5 cm x 12.5 cm
•    PC for system control and data conversion (DXF, CIF and GDSII), with built-in LayoutEditor CAD software for pattern design/editing