Laboratory of Nanofabrication

• Nanofabrication Laboratory - Scanning Electron Microscopy - Focused Ion Beam (SEM-FIB)
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• Nanofabrication Laboratory - Atomic Force Microscopy
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• Nanofabrication Laboratory - X-Ray Diffraction XRD Facilities
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• Characterization Laboratory - Confocal Laser Scanning Microscope
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SEM-FIB – Zeiss Auriga CrossBeam Workstation

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New generation of CrossBeam system allowing for unique imaging possibilities, advanced analytics and precise processing at a nanoscale level.

The main features of the equipment are described below:

•  SEM column 
•  Schottky Field Emitter, resolution of 1.0 nm @ 15 kV, 1.9 nm @ 1 kV, acceleration voltage between 0.1 and 30 kV. 
•  FIB column 
•  Ga liquid metal ion source (LMIS), resolution <7 nm @ 30 kV, acceleration voltage between 1 and 30 kV, probe current between 1 pA and 50 nA. 
•  Imaging with different detectors 
•  Everhart-Thornley type SE, In-lens SE and BSD detectors. Possibility of 3D reconstruction using combined SEM and FIB columns. 
•  Microstructural and chemical analysis 
•  Oxford INCA Energy 350 (EDS), Oxford HKL Advance, Nordlys II-S (EBSD, EBSD 3D). 
•  Gas injection system 
•  Deposition of C, Pt and SiO2, selective etching of dielectrics with XeF2, local charge compensation system to reduce charging effects in non-conductive samples. 
•  Lithography 
•  Nanolithography using electrons or ions, milling of imported bitmaps or CAD files, electrostatic beam blanker. 
•  Heating stage 
•  Kammrat & Weiss, heating up to 1050 °C for in-situ analysis of sample evolution with temperature. 
•  Nanoprobes 
•  4 Kleindiek nanotechnik nanomanipulators for electrical measurements of nanodevices