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b Deuermeier J a
,
Wardenga HF b
,
Morasch J b
,
c Siol S b
,
Nandy S a
,
Calmeiro T a
,
Martins R a
,
Klein A b
,
Fortunato E a
. 2016.
Highly conductive grain boundaries in copper oxide thin films
.
Journal of Applied Physics. 119
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b Deuermeier J a
,
d Bayer TJM b
,
Yanagi H c
,
Kiazadeh A a
,
Martins R a
,
Klein A b
,
Fortunato E a
. 2016.
Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3 interface
.
Materials Research Express. 3
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R&D - ID TEAMS
Materials for Electronics, Optoelectronics and Nanotechnologies (MEON)
Soft and Biofunctional Materials Group (SBMG)
Structural Materials (SM)