Rui Miguel dos Santos Martins

Structural Materials
Invited Scientist (BCC grant) at Instituto Superior Técnico/Universidade de Lisboa


Collaborator of CENIMAT/I3N and Institute for Plasmas and Nuclear Fusion (IPFN). - 10/2008 – PhD in Materials Engineering, degree by Faculty of Sciences and Technology of the New University of Lisbon (FCT/UNL), Portugal. Thesis work carried out in the Rossendorf Beamline (ROBL) at the European Synchrotron Radiation Facility (ESRF), France, and at the Helmholtz-Zentrum Dresden-Rossendorf (HZDR), Germany. - 07/2004 – MSc in Materials Engineering (2 years degree), degree by FCT/UNL. Joint Programme of six Portuguese Universities: IST/UTL, FCT/UNL, FE/UP, UA, FCT/UC, UM. - 12/2000 – Graduation in Materials Engineering (5 years degree), FCT/UNL. - Main scientific interests: In-situ x-ray diffraction studies during growth of thin films and their complementary ex-situ characterization; Ni-Ti surface modification by ion implantation for enhanced biocompatibility and corrosion performance in biomedical applications; Synchrotron radiation-based micro-computed tomography applied to the study of vertebrate fossils from the Mesozoic of Portugal and from the Permian of Mozambique.

Main publications

“Filling the gaps of dinosaur eggshell phylogeny: Late Jurassic Theropod clutch with embryos from Portugal”, R. Araújo, R. Castanhinha, R.M.S. Martins, O. Mateus, C. Hendrickx, F. Beckmann, N. Schell, L.C. Alves, Scientific Reports 3 (2013) 1924 (8 pages).

"Texture development, microstructure and phase transformation characteristics of sputtered Ni-Ti Shape Memory Alloy films on TiN<111>", R.M.S. Martins, N. Schell, H. Reuther, L. Pereira, Mahesh, R.J.C. Silva, F.M.B. Fernandes, Thin Solid Films 519 (2010) 122-128.

"Structural evolution of magnetron sputtered Shape Memory Alloy Ni-Ti films", R.M.S. Martins, N. Schell, J.v. Borany, K.K. Mahesh, R.J.C. Silva, F.M.B. Fernandes, Vacuum 84 (2010) 913-919.

"The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films", M. Beckers, C. Höglund, F. Giuliani, J.v. Borany, R.M.S. Martins, P.O.Å. Persson, L. Hultman and W. Möller, J. Appl. Phys. 106 (2009) 064915-1-064915-7.

"Study of graded Ni-Ti Shape Memory Alloy film growth on Si(100) substrate"; R.M.S. Martins, N. Schell, A. Mücklich, H. Reuther, M. Beckers, R.J.C. Silva, L. Pereira, F.M.B. Fernandes, Appl. Phys. A 91 (2008) 291-299.

“Growth of sputter-deposited Ni-Ti thin films: effect of a SiO2 buffer layer”; R.M.S. Martins, N. Schell, M. Beckers, K.K. Mahesh, R.J.C. Silva, F.M.B. Fernandes, Appl. Phys. A 84 (2006) 285-289.

“The influence of a poly-Si intermediate layer on the crystallization behaviour of Ni-Ti SMA magnetron sputtered thin films”; R.M.S. Martins, F.M.B. Fernandes, R.J.C. Silva, L. Pereira, P.R. Gordo, M.J.P. Maneira, M. Beckers, A. Mücklich, N. Schell, Appl. Phys. A 83 (2006) 139-145.

“Microstructure and non-basal plane growth of epitaxial MAX phase Ti2AlN thin films”; M. Beckers, N. Schell, R.M.S. Martins, A. Mücklich, W. Möller, L. Hultman, J. Appl. Phys. 99 (2006) 034902-1-034902-8.