Master Thesis (January 2019 — October 2019)
Understanding the operation mechanism that imposes a reversible change in the resistance state of the studied devices, using X-ray photoelectron spectroscopy (XPS).
Techniques and instruments utilized during this work:
• Deposition of metal and insulator layers through physical vapour deposition techniques (via-sputtering and electron-beam) in a cleanroom environment in CEMOP (Center of Excellence in Microelectronics, optoelectronics and Processes);
• Electrical characterization using Agilent 4155C and Keithley 4200SCS semiconductor parameter analysers;
• Surface and in-depth chemistry analysis using X-ray photoelectron spectroscopy (XPS) (Kratos Axis Supra), using CasaXPS software to calculate the atomic ratios and oxidation states;
• Surface topography analysis using Scanning Electron Microscopy (Hitachi TM 3030Plus Tabletop).