Spinners for resist coating and development

Location: Clean room CEMOP – lithography lab
Responsible: Pedro Barquinha
   
Description:
3 manual spin coaters available for positive resist coating (Suss LabSpin6 bench-mounted), negative resist and PDMS coating (Suss CT62 bench-mounted) and resist development (Suss LabSpin6 table-top).
Specifications:
•    Suss Labpsin6 bench-mounted – for positive resist coating
    o    up to 150 mm round or 4" square substrates
    o    Programmable recipes with a maximum of 40 steps each
    o    Maximum spin speed: 8000 rpm
    o    Maximum acceleration: 4000 rpm/s

•    Suss CT62 bench-mounted – for negative resist and PDMS coating
    o    up to 150 mm round or 4" square substrates
    o    Programmable recipes
    o    Maximum spin speed: 10000 rpm
    o    Maximum acceleration: 5000 rpm/s

•    Suss Labpsin6 table-top – for resist development
    o    up to 150 mm round or 4" square substrates
    o    Programmable recipes with a maximum of 40 steps each
    o    Maximum spin speed: 8000 rpm
    o    Maximum acceleration: 4000 rpm/s
    o    Developer dispense and nitrogen drying systems