<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Kumar, M.a</style></author><author><style face="normal" font="default" size="100%">Singh, R.a</style></author><author><style face="normal" font="default" size="100%">Nandy, S.b</style></author><author><style face="normal" font="default" size="100%">Ghosh, A.a</style></author><author><style face="normal" font="default" size="100%">Rath, S.c</style></author><author><style face="normal" font="default" size="100%">Som, T.a</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Tunable optoelectronic properties of pulsed dc sputter-deposited ZnO:Al thin films: Role of growth angle</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of Applied Physics</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Al-doped zinc oxide</style></keyword><keyword><style  face="normal" font="default" size="100%">Aluminum</style></keyword><keyword><style  face="normal" font="default" size="100%">Average grain size</style></keyword><keyword><style  face="normal" font="default" size="100%">Conductive films</style></keyword><keyword><style  face="normal" font="default" size="100%">Deposition</style></keyword><keyword><style  face="normal" font="default" size="100%">Kelvin probe force microscopy</style></keyword><keyword><style  face="normal" font="default" size="100%">Optical properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Optoelectronic properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Oxide films</style></keyword><keyword><style  face="normal" font="default" size="100%">Shadowing effects</style></keyword><keyword><style  face="normal" font="default" size="100%">Technological applications</style></keyword><keyword><style  face="normal" font="default" size="100%">Thin films</style></keyword><keyword><style  face="normal" font="default" size="100%">Transparent conductive oxides</style></keyword><keyword><style  face="normal" font="default" size="100%">Work function</style></keyword><keyword><style  face="normal" font="default" size="100%">Zinc oxide</style></keyword><keyword><style  face="normal" font="default" size="100%">ZnO:Al thin films</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2016</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-84977614102&amp;doi=10.1063%2f1.4955056&amp;partnerID=40&amp;md5=5d0b2f3abe33bd9e2d33fa37b4b50ae3</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">1</style></number><publisher><style face="normal" font="default" size="100%">American Institute of Physics Inc.</style></publisher><volume><style face="normal" font="default" size="100%">120</style></volume><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">In this paper, we investigate the role of deposition angle on the physical properties and work function of pulsed dc sputter-deposited Al-doped zinc oxide (AZO) thin films. It is observed that average grain size and crystal quality increase with higher angle of deposition, yielding improved optical properties. A systematic blue shift as well as a decrease in the resistivity takes place with the increasing growth angle up to 70°, while an opposite trend is observed beyond that. In addition, the work function of AZO films is also measured using Kelvin probe force microscopy, which corroborates well with the optical and structural properties. The observed results are explained in the framework of growth angle induced diffusion and shadowing effects. The films deposited at higher angles will be important for rapid incorporation into new technological applications that require a transparent conductive oxide. © 2016 Author(s).</style></abstract><notes><style face="normal" font="default" size="100%">cited By 0</style></notes></record></records></xml>