<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lyubchyk, A.</style></author><author><style face="normal" font="default" size="100%">Vicente, A.</style></author><author><style face="normal" font="default" size="100%">Alves, P.U.</style></author><author><style face="normal" font="default" size="100%">Catela, B.</style></author><author><style face="normal" font="default" size="100%">Soule, B.</style></author><author><style face="normal" font="default" size="100%">Mateus, T.</style></author><author><style face="normal" font="default" size="100%">Mendes, M.J.</style></author><author><style face="normal" font="default" size="100%">Águas, H.</style></author><author><style face="normal" font="default" size="100%">Fortunato, E.</style></author><author><style face="normal" font="default" size="100%">Martins, R.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Influence of post-deposition annealing on electrical and optical properties of ZnO-based TCOs deposited at room temperature</style></title><secondary-title><style face="normal" font="default" size="100%">Physica Status Solidi (A) Applications and Materials Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Annealing</style></keyword><keyword><style  face="normal" font="default" size="100%">Argon</style></keyword><keyword><style  face="normal" font="default" size="100%">Atmospheric pressure</style></keyword><keyword><style  face="normal" font="default" size="100%">Conductive films</style></keyword><keyword><style  face="normal" font="default" size="100%">Deposition</style></keyword><keyword><style  face="normal" font="default" size="100%">Earth-abundant materials</style></keyword><keyword><style  face="normal" font="default" size="100%">Electrical and optical properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Electrooptical properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Hydrogenation</style></keyword><keyword><style  face="normal" font="default" size="100%">Optical properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Optoelectronic properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Oxide films</style></keyword><keyword><style  face="normal" font="default" size="100%">Post deposition annealing</style></keyword><keyword><style  face="normal" font="default" size="100%">Structural improvements</style></keyword><keyword><style  face="normal" font="default" size="100%">Thin films</style></keyword><keyword><style  face="normal" font="default" size="100%">Tin oxides</style></keyword><keyword><style  face="normal" font="default" size="100%">Transparent conductive oxide (TCOs)</style></keyword><keyword><style  face="normal" font="default" size="100%">Transparent conductive oxides</style></keyword><keyword><style  face="normal" font="default" size="100%">Zinc</style></keyword><keyword><style  face="normal" font="default" size="100%">Zinc oxide</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2016</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-84982994261&amp;doi=10.1002%2fpssa.201532891&amp;partnerID=40&amp;md5=ea9487c378501ea3762892053d670477</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">9</style></number><publisher><style face="normal" font="default" size="100%">Wiley-VCH Verlag</style></publisher><volume><style face="normal" font="default" size="100%">213</style></volume><pages><style face="normal" font="default" size="100%">2317-2328</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">The post-deposition modification of ZnO-based transparent conductive oxides (TCOs) can be the key to produce thin films with optoelectronic properties similar to indium tin oxide (ITO), but at a much lower cost. Here, we present electro-optical results achieved for post-deposition annealing of Al–Zn–O (AZO), AZO:H, Ga–Zn–O:H (GZO:H), and Zn–O:H (ZNO:H) thin films deposited by RF sputtering at room temperature. These studies comprise results of thermal annealing at atmospheric pressure, vacuum, forming gas, H2 and Ar atmospheres, and H2 and Ar plasmas, which lead to significant enhancement of their electro-optical properties, which are correlated to morphological and structural improvements. The post-deposition annealing leads to an enhancement in resistivity above 40% for AZO, AZO:H, and GZO:H, reaching ρ ≈ 2.6–3.5 × 10−4 Ωcm, while ZnO:H showed a lower improvement of 13%. The averaged optical transmittance in the visible region is about 89% for the investigated TCOs. Such results match the properties of state-of-art ITO (ρ ≈ 10−4 Ωcm and transmittance in VIS range of 90%) employing much more earth-abundant materials. © 2016 WILEY-VCH Verlag GmbH &amp; Co. KGaA, Weinheim</style></abstract><notes><style face="normal" font="default" size="100%">cited By 0</style></notes></record></records></xml>