<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Zubizarreta, C.a</style></author><author><style face="normal" font="default" size="100%">G-Berasategui, E.a</style></author><author><style face="normal" font="default" size="100%">Ciarsolo, I.a</style></author><author><style face="normal" font="default" size="100%">Barriga, J.a</style></author><author><style face="normal" font="default" size="100%">Gaspar, D.b</style></author><author><style face="normal" font="default" size="100%">Martins, R.b</style></author><author><style face="normal" font="default" size="100%">Fortunato, E.b</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">The influence of target erosion grade in the optoelectronic properties of AZO coatings growth by magnetron sputtering</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Surface Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">Aluminum coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">Aluminum-doped zinc oxide</style></keyword><keyword><style  face="normal" font="default" size="100%">Carbon</style></keyword><keyword><style  face="normal" font="default" size="100%">Ceramic materials</style></keyword><keyword><style  face="normal" font="default" size="100%">Ceramic target</style></keyword><keyword><style  face="normal" font="default" size="100%">Coatings</style></keyword><keyword><style  face="normal" font="default" size="100%">Erosion</style></keyword><keyword><style  face="normal" font="default" size="100%">Grading</style></keyword><keyword><style  face="normal" font="default" size="100%">Green manufacturing technique</style></keyword><keyword><style  face="normal" font="default" size="100%">Hardening</style></keyword><keyword><style  face="normal" font="default" size="100%">Light emitting diodes</style></keyword><keyword><style  face="normal" font="default" size="100%">Magnetron sputtering</style></keyword><keyword><style  face="normal" font="default" size="100%">Manufacture</style></keyword><keyword><style  face="normal" font="default" size="100%">Optical films</style></keyword><keyword><style  face="normal" font="default" size="100%">Optoelectronic applications</style></keyword><keyword><style  face="normal" font="default" size="100%">Optoelectronic devices</style></keyword><keyword><style  face="normal" font="default" size="100%">Optoelectronic properties</style></keyword><keyword><style  face="normal" font="default" size="100%">Sputtering</style></keyword><keyword><style  face="normal" font="default" size="100%">Target erosion</style></keyword><keyword><style  face="normal" font="default" size="100%">Tin oxides</style></keyword><keyword><style  face="normal" font="default" size="100%">Transparent conductors</style></keyword><keyword><style  face="normal" font="default" size="100%">Visible spectral regions</style></keyword><keyword><style  face="normal" font="default" size="100%">Yarn</style></keyword><keyword><style  face="normal" font="default" size="100%">Zinc coatings</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2016</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-84956679889&amp;doi=10.1016%2fj.apsusc.2016.01.147&amp;partnerID=40&amp;md5=6affb1aabea42002deaf7dfedb27f5cc</style></url></web-urls></urls><publisher><style face="normal" font="default" size="100%">Elsevier</style></publisher><volume><style face="normal" font="default" size="100%">380</style></volume><pages><style face="normal" font="default" size="100%">218-222</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Aluminum-doped zinc oxide (AZO) transparent conductor coating has emerged as promising substitute to tin-doped indium oxide (ITO) as electrode in optoelectronic applications such as photovoltaics or light emitting diodes (LEDs). Besides its high transmission in the visible spectral region and low resistivity, AZO presents a main advantage over other candidates such as graphene, carbon nanotubes or silver nanowires; it can be deposited using the technology industrially implemented to manufacture ITO layers, the magnetron sputtering (MS). This is a productive, reliable and green manufacturing technique. But to guarantee the robustness, reproducibility and reliability of the process there are still some issues to be addressed, such as the effect and control of the target state. In this paper a thorough study of the influence of the target erosion grade in developed coatings has been performed. AZO films have been deposited from a ceramic target by RF MS. Structure, optical transmittance and electrical properties of the produced coatings have been analyzed as function of the target erosion grade. No noticeable differences have been found neither in optoelectronic properties nor in the structure of the coatings, indicating that the RF MS is a stable and consistent process through the whole life of the target. © 2016 Elsevier B.V.</style></abstract><notes><style face="normal" font="default" size="100%">cited By 0</style></notes></record></records></xml>